Rapid Thermal Processing (RTP) is the use of infrared lamp heating technology and cavity cold wall technology to achieve rapid heating and cooling, so as to achieve a specific heat treatment process. Its main application field is the semiconductor field represented by the integrated circuit field (the first generation semiconductor represented by silicon) and the optoelectronics field (the second generation semiconductor represented by gallium arsenide). In the semiconductor process, heat treatment/annealing is an essential process, because semiconductor devices are designed to achieve functionalization, which means the input/output of electrical signals, which require metal electrodes to assist. To get good contact, it needs to be optimized through the annealing/diffusion process. Of course, metal alloying is only one of the most important functions of the fast annealing furnace, and there are other applications in other related fields.
First, the manufacturer
As the saying goes, you need to be hard! A good product is inseparable from a good enterprise! An enterprise must go through the accumulation of patents and technology precipitation, as well as not divorced from the market and the user's mentality, in order to create a product that meets user expectations. Therefore, the choice of fast annealing furnace must first consider the hard strength of the manufacturer!