Rapid annealing furnace adopts advanced microcomputer control system and PID closed-loop temperature control, which can achieve high temperature control accuracy and temperature uniformity, and can be equipped with vacuum chamber or multi-channel gas according to user process requirements.
The fast annealing furnace uses a halogen infrared lamp as a heat source to quickly heat wafers or materials to 300°C-1200°C through a faster heating rate, thereby eliminating some defects of wafers or materials and improving product performance.
Fast annealing furnace (chip heat treatment equipment) is widely used in the production of IC wafers, LED wafers, MEMS, compound semiconductors, power devices and other chip products, as well as ohmic contact rapid alloying, ion implantation annealing, oxide growth, stress relief in densification, densification and other processes. Rapid heat treatment is used to improve the crystal structure and photoelectric properties, with high technical index, complex process and strong specificity.
Rapid annealing furnace hardware replacement
1, the heating lamp replacement: the heating lamp exceeds the service life or is not bright need to be replaced. The service life of the heat lamp is 3000 hours, and its service life will be reduced at high temperatures.
2, vacuum pump oil replacement: during use, please observe the vacuum oil gauge once a quarter. When the oil gauge shows that the oil level is less than 1/3, please add the vacuum pump oil to more than half of the oil gauge.
3, thermocouple replacement: when the temperature is abnormal or damaged, the thermocouple needs to be replaced. The normal service life of the thermocouple is 3 months, and its service life is shortened by environmental factors.
4. Replace the O-ring: When the O-ring surface is obviously damaged or cannot be sealed, the O-ring needs to be replaced. Its service life is affected by external force and temperature factors.